Magnetron Sputtering Coating System
A magnetron sputtering coater utilizes advanced magnetron sputtering technology to deposit uniform, dense films with strong adhesion onto various substrates. This industrial coating system is ideal for automotive hubs, stainless steel kitchenware, and numerous other applications.
Technical Specifications Table
| Model |
Lion-12515 |
Lion-1820 |
Lion-2323 |
Lion-2345 |
Lion-2368 |
| Chamber Size (mm) |
D1250×H1500 |
D1800×H2000 |
D2300×H2300 |
D2300-2500×H4500 |
D2300-2500×H6800 |
| Arc |
10 |
18 |
22 |
40-42 |
58-62 |
| Arc Power |
200A |
| Bias Power |
30KW--120KW |
| Gas |
Ar, N₂, C₂H₂, O₂ |
| Cooling |
Water cooling circulation with industrial cooling tower, water chiller, or cryogenic system |
| Vacuum Index |
Extract time (no load cold state): from atmosphere to 9.9×10⁻³Pa ≤10min |
| Ultimate Vacuum |
Superior to 5.0×10⁻⁴Pa |
| Pressure Rising |
New machine cold state air leaking rate ≤0.5Pa/h |
| Occupation |
10 |
15 |
18 |
50 |
75 |
Note: All configurations and sizes are custom-made according to customer requirements and specific product processing needs.
Key Advantages
- Produces uniform, dense films with exceptional adhesion
- Water-cooled target minimizes radiation heat generation
- Compatible with virtually any metallic target material
- Capable of sputtering non-conductive materials using RF or MF power
- Excellent layer uniformity and smooth coating surfaces
Technology Overview
Magnetron sputtering is a plasma coating process where ions bombard the target surface in a vacuum chamber filled with inert gas (typically argon). The resulting plasma causes target material ejection, creating a sputtered coating layer on products positioned in front of the target.
Color Customization
Our system offers coatings in various metal colors including gold, rose gold, silver, steel, nickel, bronze, anthracite, and black. Color composition can be fine-tuned using zirconium, titanium, nitrogen, carbon, oxygen, and other metals to meet your specific market requirements.
Applications
Widely used for watchbands, watchcases, jewelry, smartphones, electronics, sanitary ware, golf hardware, tableware, cosmetics, and decorative coatings including TiN, TiC, TiCN, TiAlN, CrN, and AF coatings.
Technical Specifications
Film Types & Applications
| Film Type |
Typical Applications |
| Metal & Alloy Films |
Semiconductor interconnections, electronic device electrodes |
| Insulating Films |
Electronic component packaging, optical device substrates |
| Optical Films |
Lenses, displays, optical filters |
| Decorative & Protective Films |
Jewelry, hardware, cutting tools and molds |
| Functional Composite Films |
Electronic displays, medical devices, new energy products |
Equipment Features
Pulse Parameter Flexibility
Precise adjustment of pulse frequency, duty cycle, and peak power to adapt to different target materials and coating requirements. High-end models achieve pulse frequencies up to 150kHz.
Material Compatibility
Handles metal targets (Ti, Al) and insulating targets (Al₂O₃, TiO₂) through bidirectional pulse or medium-frequency AC modes. Low-temperature process design accommodates heat-sensitive substrates.
Integration & Intelligence
Equipped with integrated vacuum manipulators, online film thickness monitoring, and automatic alignment systems for continuous multi-chamber production.
Performance Advantages
- Significantly reduces film layer defects
- Increases target material utilization from 20% to 45%
- Reduces target material consumption by 40%
- Lowers rare metal costs by 30%
- Achieves deposition rates up to 10nm/s
- Prevents target poisoning during compound film deposition
